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| 반도체작업환경의 VOCs 농도분포 특성 | |||||
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| 글쓴이 | 관리자 (IP: *.86.222.79) | 작성일 | 2019-04-19 18:37 | 조회수 | 1,724 |
반도체작업환경의 VOCs 농도분포 특성 Emission Characteristics of VOCs Distributions in Semiconductor Workplace 초록 In this study, a Proton-Transfer Reaction-Time-of-Flight Mass spectrometer (PTR-TOF-MS) was used for the continuous monitoring of Volatile Organic Compounds (VOCs) emitted from semiconductor workplace such as photolithography (PHOTO), flat panel display (FPD), organic light emitting diode (OLED), etching (WET) process. The averaged VOCs mixing ratio in the such workplace, PHOTO was 6.5 ppm, FPH was 6.4 ppm, WET was 2.0 ppm and OLED was 1.3 ppm, respectively. The abundance of VOCs in the workplace were methyl ethyl ketone (MEK) with 2.8 ppm (69%) and acetaldehyde with 0.5 ppm (13.2%). Depending on the semiconductor process characteristics, various VOCs have been observed in the workplace. The VOCs mixing ratio are lower than the workplace regulation standard (TWA), it is necessary to continuously monitor and effectively manage these VOCs.
출처: 한국도시환경학회지 제18권 4호
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| 파일 | 반도체작업환경의 VOCs 농도분포 특성.pdf(1.3M) | ||||